| 摘要 |
<p>A copper film layer (11) and a resin film (12) are sequentially layered on a skin material (10), the resin film (12) is irradiated with a laser beam so as to be removed, a mask is formed on the copper film layer (11) by use of the residual of the resin film (12), thereafter, an etching process is provided thereto, so that a copper film layer pattern is formed on the reflective surface of the skin material (10). <IMAGE></p> |
| 申请人 |
KABUSHIKI KAISHA TOSHIBA |
发明人 |
YAMASHITA, AKIRA, C/O KABUSHIKI KAISHA TOSHIBA;FURUKAWA, KOICHI, C/O KABUSHIKI KAISHA TOSHIBA;ORIKASA, TERUAKI, C/O KABUSHIKI KAISHA TOSHIBA;GOTO, NORIAKI, C/O KABUSHIKI KAISHA TOSHIBA;MATSUNAKA, SHIGEKI, C/O KABUSHIKI KAISHA TOSHIBA;KAWADA, YOSHITAKA, C/O KABUSHIKI KAISHA TOSHIBA |
