| 摘要 |
PURPOSE:To easily obtain a uniform deposited film having high quality by forming a deposited film on a substrate with a precursor produced from a gaseous starting material and a gaseous oxidizing agent as a source for feeding a film forming element so as to simplify the control of the quality of a film. CONSTITUTION:A gaseous starting material (a chain silane compound) and a gaseous oxidizing agent having oxidizing action on the starting material are introduced into a reaction space, where they are brought into chemical contact with each other to produce plural kinds of precursors including an excited precursor. A deposited film is formed on a substrate with one or more kinds of such precursors as sources for feeding a deposited film forming element. |
