| 摘要 |
PURPOSE:To measure the line width correctly by subjecting an image signal obtained through an electronic microscope to A/D conversion, storing the converted signal in am image memory and referring to a semiconductor pattern and a waveform data related to a semiconductor pattern being measured. CONSTITUTION:A previously written reference pattern is scanned by means of an electronic microscope and an analog image signal therefrom is digitized before being stored in an image memory 3. The image signal is then processed by a CPU 7 according to a calculation procedure stored in a procedure data memory 6 thus storing a reference pattern edge position and a required data in a reference pattern data memory 4. At the time of measurement, a required data of pattern to be measured is stored in a pattern data memory 5 to be measured according to the similar procedure. Edge position of a pattern to be inspected, corresponding to that of the reference pattern, is then detected by collating the patterns through the use of these data and the collation results are presented on a display 8. |
