| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist material having high resolving power to far UV, etc., undergoing no change with the lapse of time and giving a high precision pattern by incorporating a specified polymer, a photosensitive compd. which generates an acid by exposure and a solvent capable of dissolving them. SOLUTION: This resist material contains a polymer represented by the formula, a photosensitive compd. which generates an acid by exposure and a solvent capable of dissolving them. In the formula, R<1> is H or methyl, each of R<2> and R<3> is H, 1-6C straight chain, branched or cyclic alkyl, both of R<2> and R<3> are not H, R<4> is 1-10C straight chain, branched or cyclic alkyl, etc., R<5> is H or cyano, R<6> is H or methyl, R<7> is H, cyano, etc., each of (k) and (l) is a natural number, 0.1<=k/(k+1)<=0.9, (m) is 0 or a natural number and 0.05<=m/(k+l+m)<=0.50. |
