| 摘要 |
<p>PROBLEM TO BE SOLVED: To eliminate the induction of wafer transfer error due to leak phenomenon of vacuum pressure and prevent the contamination of the wafer by providing horizontal holding means for positioning the wafer in a horizontal state at a predetermined position on the top surface of a main body and an extended portion of each wafer supporting plate. SOLUTION: A rectangular main body 11 and a pair of right and left wafer supporting plates 12 projecting out from the side faces of the main body 11 are provided. Also, at the predetermined position on the top surface of the water supporting plate 12, a vacuum line 13 formed through the inside of the wafer supporting plate 12 and the main body 11 and a vacuum hole 14 communicating with the vacuum line 13 and formed at a predetermined height are arranged. In such a robot arm 10 for transferring the semiconductor wafer, an extension 15 with a predetermined length is extended and formed from the tip portion of each wafer supporting plate 12. In addition, horizontal holding means 20 is provide at the predetermined position on the top surface of the extension 15 and main body 11 for horizontally positioning the wafer placed on the top of the wafer supporting plate 12.</p> |
