| 摘要 |
PROBLEM TO BE SOLVED: To stably preserve a positive type photoresist over a long period of time without varying the quality of the photoresist by preserving the photoresist contg. novolak resin and a quinonediazido compd. at a specified temp. SOLUTION: A positive type photoresist contg. novolak resin and a quinonediazido compd. is preserved at <=10 deg.C preferably in an environment ensuring <=8% transmissivity of light of <=500nm, especially <=5% transmissivity of light of <=400nm. The novolak resin is obtd. by condensing a phenolic compd. and aldehyde in the presence of an acid catalyst, e.g. an inorg. acid such as hydrochloric acid, an org. acid such as oxalic acid or a divalent metallic salt such as zinc acetate. The degradation of the quinonediazido compd. can be suppressed and the photoresist is stably preserved over a long period of time. |
