MANUFACTURE OF MICROCHIP OF FIELD EMISSION ELEMENT

摘要

PROBLEM TO BE SOLVED: To manufacture a microchip of a field emission element accurately with uniform shape. SOLUTION: An oxide film 23 on a silicon substrate 21 is patterned, and using it as a mask, an impurity layer 24 is formed in the silicon substrate 21. Using a solution of hydrofluoric acid as an electrolytic solution, only the impurity layer 24 of a high concentration is formed in a porous silicon layer 25 through positive electrode reactions, and the obtained porous silicon layer 25 is oxidated at a high temp. so that precise microchips 22 are manufactured uniformly.