发明名称 Semiconductor memory device for DRAM cell
摘要 The module includes several contact sections on a substrate surface (1) which comprises an insulating layer (2,3,5) deposited on the substrate surface. A conductive section (6) with a contact section (6a) is located in the insulating layer near the main surface of the semiconductor substrate. A silicon nitride layer (4) covers the substrate main surface and the conductive section is deposited in the insulating layer. Through the insulating layer and the silicon nitride layer runs a conductive path up to the contact section. Preferably the insulating layer contains a conductor (10) coupled by a conductive path to one contact section (1b) of the semiconductor substrate.
申请公布号 DE19629736(A1) 申请公布日期 1997.07.31
申请号 DE19961029736 申请日期 1996.07.23
申请人 MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP 发明人 EIMORI, TAKAHISA, TOKIO/TOKYO, JP;KIMURA, HIROSHI, TOKIO/TOKYO, JP
分类号 H01L21/60;H01L21/8242;(IPC1-7):H01L21/283;H01L27/108 主分类号 H01L21/60
代理机构 代理人
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