发明名称 SOLUBLE FUSE FOR SEMICONDUCTOR INTEGRATED CIRCUIT
摘要 <p>PROBLEM TO BE SOLVED: To use a soluble fuse as a memory device without losing reliability of an integrated circuit by providing a narrow cross sectional part on a conductive path as a reference fusion point, and disposing the surface of the reference fusion point in a cavity. SOLUTION: A polysilicon conductive path 4 surrounded by a lower insulating layer 2 and an upper insulating layer 3 is placed on a semiconductor substrate 1. The conductive path 4 includes a narrow cross sectional part that is obtained by reducing its width. The narrow cross sectional part is used as a reference fusion point S of the conductive path 4, and the surface of the reference fusion point S is disposed in a cavity H. A coating layer 6 of silicon nitride or another proper material is provided over the cavity H to close the same. Hereby, a soluble fuse can be used as a memory device.</p>
申请公布号 JPH09199603(A) 申请公布日期 1997.07.31
申请号 JP19970010092 申请日期 1997.01.06
申请人 SIEMENS AG 发明人 UORUFUGANGU UERUNAA;KAARUHAINTSU MIYURAA;HORUGAA PEERE
分类号 H01L21/82;H01L23/525;H01L23/58;(IPC1-7):H01L21/82;H01H85/00 主分类号 H01L21/82
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