| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an electron source at a large area having high reliability and high performance, which can be manufactured by a manufacturing device at a low cost even in the case of using a substrate at a large area and in which a wiring and an insulating layer at a thick film thickness can be formed, and to provide an image forming device, on which a display panel using this electron source is mounted. SOLUTION: A fine wire mnsulating layer 10 at 100μm or less of thickness is used so as to print the outline of an insulating layer pattern to be required (a). At this stage, film thickness of the formed fine wire insulating layer 10 can be formed thick in comparison with a pattern at a desirable insulating layer width, and the extension of width of the insulating layer can be restricted small. A pattern of an insulating layer 11 to be required is printed so as to be overlapped with the formed outline, and the interior of this pattern is coated (b). Furthermore, the insulating layer 11 to be required is overlapped thereon for printing, and an insulating layer, which has a sharp edge and the relatively even film thickness and in which a recess exists near the center of the insulating layer, can be formed (c).</p> |
