PHOTORESIST DEVELOPMENT CONTROL APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide a photoresist development control apparatus capable of reliably controlling the line width even if the development condition changes. SOLUTION: The thickness of a photoresit film under development is detected in real time by an optical film thickness detecting means 4. Upon receipt of the detection signal from this means 4, a signal generating means 5 generates an end signal to inform the end of the development after a certain time lapsed from the melting-away of the photoresist. A conveying means 6 lifts a wafer carrier 3 from a developing liq. in a developing tank 1 upon receipt of this end signal.