| 摘要 |
<p>A resist composition having improved sensitivity, resolution, and heat resistance and comprising (a) a polymer comprising structural units having a group instable against acids and (b) a radiation-sensitive compound capable of generating acids upon irradiation with an actinic radiation, wherein the polymer (a) is one prepared by polymerizing 10 to 100 % by weight of a (meth)acrylic ester (i) containing an allyl group having at least two substituents as an alcohol residue with 0 to 90 % by weight of a monomer (ii) copolymerizable with the (meth)acrylic ester, and a method for pattern formation using the resist composition.</p> |
