| 摘要 |
PURPOSE:To provide a method of easily inspecting the dislocation of a pattern, which occurs during drawing a reticle pattern, and guaranteeing the accuracy in arrangement of a pattern in every reticle. CONSTITUTION:At start and end of the drawing of a reticle pattern, an inspection pattern 1A at start of the drawing and an inspection pattern 1B at end of the drawing are drawn one over the other on a substrate, leaving space between them, whereby the accuracy in arrangement of a pattern is verified by observing that space. |
