| 摘要 |
<p>PURPOSE:To facilitate the arrangement design of the patterns of a phase-shifting mask, which is used in a matching exposure using a step-and-repeater, and to shorten a mask-making period. CONSTITUTION:In a process of performing a multiple exposure, phase shifter parts 111 of a necessary fine line width and a light-shielding part 101 are previously held arranged in a first photomask and in a second photomask, first light-shielding parts 102a are respectively arranged at the positions of desired fine patterns formed by the fist photomask, whereby the desire fine patterns formed by the first photomask are selectively exposed. Moreover, the selected desired fine patterns formed by the first photomask are connected to each other by end edge patterns, which are formed at second light-shielding parts 102b of the second photomask.</p> |
