| 摘要 |
PURPOSE:To selectively perform the functions required for multiple processes as necessary by a method wherein respectively exclusive etching vessels are provided with common specifications and independently required specifications. CONSTITUTION:An oxide film etching process is the general etching process and buffered fluoric acid is the general etching chemical solution while almost two types of solutions are utilized for each process by depending upon the mixing ratio of buffered fluoric acid. The processing vessels are composed of the first vessel 1 containing activated solution, the second vessel 2 containing (BHF-1) and the third vessel 3 containing (BFH-2) (with different mixing ratio from that of BHF-1) while the forth vessel 4 and the fifth vessel 5 are washing vessels. In such processing vessels, the etching processes using BHF-1, BHF-2 as constituents with different mixing ratio can be selectively performed. |
