发明名称 |
XSENMASUKUKOZOTAINOSEIZOHOHO |
摘要 |
<p>Proposed is a high-precision X-ray lithographic mask blank with reinforcement free from warping or distortion. The mask blank is an integral body comprising: (a) a frame made from a silicon wafer; (b) a membrane of an X-ray permeable material such as silicon carbide adhering to and supported by one surface of the frame; and (c) a reinforcing member made from a single crystal of silicon adhesively bonded to the other surface of the frame with (d) a layer of silicon oxide intervening between the frame and the reinforcing member. The mask blank can be prepared in a process of first forming a layer of silicon oxide on the surface of the silicon wafer and/or reinforcing member prior to deposition of the X-ray permeable film on the silicon wafer and heating them together at a temperature of 800 DEG C. or lower while they are in direct contact with each other with the silicon oxide layer intervening therebetween.</p> |
申请公布号 |
JP2634714(B2) |
申请公布日期 |
1997.07.30 |
申请号 |
JP19910219207 |
申请日期 |
1991.08.05 |
申请人 |
SHINETSU KAGAKU KOGYO KK |
发明人 |
NOGUCHI HITOSHI;NAGATA AKIHIKO;KASHIDA SHU;KUBOTA YOSHIHIRO |
分类号 |
G03F1/22;G03F7/20;G21K1/06;H01L21/027;(IPC1-7):H01L21/027;G03F1/16 |
主分类号 |
G03F1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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