| 摘要 |
<p>A plurality of gate lines, a plurality of data lines crossing the gate lines, a plurality of thin film transistors formed near the intersections of the gate lines and data lines, and a plurality of picture element electrodes respectively connected to the transistors are provided on one substrate of a liquid crystal display device. A gate insulating film is formed on the gate lines and the data lines are formed on the insulating film. A protective insulating film is formed on the gate insulating film, data lines, and thin film transistors. The picture element electrodes are connected to the source electrodes of their corresponding thin film transistors through openings formed through the protective insulating film. The peripheral edge sections of the gate and protective insulating films have the same planar shape. In order to form the peripheral edge sections of the insulating films in the same shape, the insulating films are simultaneously etched in the same photomask pattern. The source electrode of each thin film transistor is composed of a metallic film having a grain size of 200 nm or greater.</p> |
