| 摘要 |
PURPOSE:To polish a material such as a semiconductor substrate at a high speed without surface defects on the polished surface thereof by adding a specific substance into an alpha-alumina-dispersion system. CONSTITUTION:Water-soluble metallic salt such as lithium or the like is added into a system consisting of water, alpha-alumina and boehmite. With the addition of the material salt, the dispersion of particles in an abradant composition may be enhanced, and accordingly, a material such as a semiconductor substrate, a laser component or the like may be polished at a high speed without surface defects such as scratches, orange peels and the like, thereby it is possible to enhance the working efficiency thereof. |
