| 摘要 |
<p>PURPOSE:To improve the accuracy of a resistance value by forming a first slit in a straight line perpendicular to the electrode-to-electrode line of a film resistance element and then extending a second slit at an acute angle to the first slit. CONSTITUTION:A trimming pattern is so made that the first slit s1 is made to cross at a right angle to the electrode-to-electrode (2 and 2) line (X direction) starting from a point (a) on the side of a film resistance element and then it is extended as the second slit s2 being descended from a point (b) toward the starting point (a). By this method, an increment ratio of the resistance value can be reduced against an increment in slit caused by the second slit s2, and thereby the resistance value of a film resistance element is made extremely closer to the target value.</p> |
