发明名称 |
PATTERN CORRECTION METHOD |
摘要 |
The pattern correction technique includes a step of covering one surface of the substrate (12) including the pattern (20) with a protective film (60) for correction, a step of exposing the one surface of the substrate (12) at a part where a defect (30, 40, 50) exists, a step of filling the part of the exposed one surface of the substrate (12) with a correcting material (70) and a step of removing the protective film (60) for correction. Either one of the protective film (60) for correction and the correcting material (70) consists of a water-soluble material and the other consists of an oil-soluble material. @(19pp Dwg.No.1B,C/2)@. |
申请公布号 |
EP0396768(B1) |
申请公布日期 |
1997.07.23 |
申请号 |
EP19890911406 |
申请日期 |
1989.10.11 |
申请人 |
KYODO PRINTING CO., LTD. |
发明人 |
FURUKAWA, TADAHIRO;KIKUCHI, TOSHIAKI;KONNO, HITOSHI |
分类号 |
G02B5/20;G03F1/72;H01L21/027;H01L21/30 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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