发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURE
摘要 <p>PROBLEM TO BE SOLVED: To restrain an interface leak current and a tunnel leak current and enable high speed operation, by constituting a junction field-effect transistor wherein a thin film active layer is sandwiched between a first conductive layer and a second conductive layer, on an insulating substrate. SOLUTION: On an insulating substrate 2, a first electrode A is formed, thereon a first conductive layer 3 composed of a first conductivity type is formed, and thereon a thin film active layer 4 composed of the other conductivity type is formed. On the thin film active layer 4, a second conductive layer 5 composed of a conductivity type is formed and thereon a second electrode B is formed. The thin film active layer 4 is sandwiched between the first conductive layer 3 and the second conductive layer 5. The active layer 4 is made a boundary, and a third electrode C which is electrically connected with the thin film active layer 4 on one side, and a fourth electrode D which is electrically connected with the thin film active layer 4 on the other side are arranged. Thereby a junction field-effect transistor provided with a thin film active layer 4 is constituted. The interface leak current is little, the tunnel leak current also can be restrained, and high speed operation is enabled.</p>
申请公布号 JPH09191017(A) 申请公布日期 1997.07.22
申请号 JP19960001412 申请日期 1996.01.09
申请人 SONY CORP 发明人 YAMANAKA HIDEO
分类号 G02F1/136;G02F1/1368;H01L21/265;H01L21/336;H01L21/337;H01L29/786;H01L29/808;(IPC1-7):H01L21/337 主分类号 G02F1/136
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