Method for making precision radomes

摘要

Radomes having complexly curved, frequency selective surfaces are made with a high degree of precision to assure part-to-part uniformity in electrical performance using a three-dimensional conformal mask and a precision etch process. The mask has a transparent substrate and a patterned opaque layer on the substrate. We expose photosensitive material overlying a thin film metal layer (generally deposited on a dielectric) through the mask. Metal exposed by patterning the photosensitive material is etched with a CuCl2 and chloride salt solution, and the remainder of the layer of photosensitive material is removed to complete the patterning.