发明名称 METODO E DISPOSITIVO PER ESEGUIRE LA SFALDATURA IN ULTRA-VUOTO DI PORZIONI DI WAFER DI SEMICONDUTTORE PROCESSATO
摘要 <p>A method and a device are provided for obtaining semiconductor bars for laser devices starting from portions of a processed wafer and carrying out the cleavage in ultra-high-vacuum. The cleavage mechanical stresses are impulsive forces and are all applied from the processed side of the wafer through a lowerable shaped member actuated by compressed helical springs, which applies these stresses on the ledging parts of the wafer portion hold on the central region thereof by a fixed support and hold down in position by a suitably shaped centering thrust member. The spring-up occurs by translating the device in the ultra-high-vacuum environment and contrasting a locking lever engaging the lowerable member in its upper position with a fixed cam. <IMAGE> <IMAGE></p>
申请公布号 IT1274540(B) 申请公布日期 1997.07.17
申请号 IT1995MI01036 申请日期 1995.05.22
申请人 ALCATEL ITALIA S.P.A. 发明人 COLOMBANI LUIGI ANGELO
分类号 B28D5/00;H01L21/301;H01L21/304;H01S5/02;(IPC1-7):H01L 主分类号 B28D5/00
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