| 摘要 |
<p>PURPOSE:To provide the mask for stepping which easily realizes inclined illumination by using the existing device as it is. CONSTITUTION:This mask 16 to be used for the stepper for fine patterns is constituted by disposing, for example, phase type gratings 14, as an optical element having a function to incline light I for irradiation according to the numerical aperture of a projection lens on the light source side of the pattern surface of a mask substrate 11 and integrating these gratings 14 and the mask substrate 11. The simultaneous mounting as well as attaching and detaching of the gratings 14 an the mask substrate 11 are possible in this way and the imaging at the highest resolution of the projection lens is possible without modifying the existing stepper. In addition, the resolution equiv. to the resolution of the phase shift mask method by the conventional system is attained with arbitrary patterns even if the phase shift mask is not used.</p> |
