| 摘要 |
PURPOSE:To enhance a yield by a method wherein a transparent conductive film for pixel electrode use and a metal film for source and drain electrode use are laminated one after another and the metal film on the transparent conductive film is removed by making use of a protective insulating film formed by simultaneously patterning them as a mask while regions used to form individual electrodes are left. CONSTITUTION:A transparent conductive film 21 used as a pixel electrode 24 and a metal film 22 used as a source electrode 26 and a drain electrode 25 are laminated one after another on a transparent insulating substrate 2 where a gate electrode 9, a gate insulating film 10 and a semiconductor film 11 have been formed one after another. While regions used to form the pixel electrode 24, the source electrode 26 and the drain electrode 25 are left, the transparent conductive film 21 and the metal film 22 are patterned simultaneously, and a pattern of a protective film 23 covering a region used to form a transistor is formed. The metal film 22 on the transparent conductive film 21 is removed by making use of this protective film 23 as a mask. By this setup, a process is simplified and a yield is enhanced. |
