发明名称 WORKING METHOD FOR FOCUSING ION BEAM WORKING DEVICE
摘要 PROBLEM TO BE SOLVED: To easily set a working position without damaging a specimen by moving by a movement data so that a specimen can be positioned on an ion beam irradiation position, to detect a display a secondary charged particle. SOLUTION: An ion beam 42, emitted from an ion gun 41, is focused on a focusing ion beam 44 by an ion optical system 43 to radiate, while scanning the work position of a specimen 1 on a specimen holder 2 placed on a work specimen stage 40. The work specimen stage 40 is moved, by input movement data, to the radiation position of a focusing ion beam 44 so that the specific region of the specimen 1 can be positioned. A secondary charged particle detector 46 detects a secondary charged particle 45, generated by the radiation of the ion beam 44, to display the strength signal of the charged particle 45 on a picture image display device 47. Moreover, organic compound vapor or an etching gas is splayed to the radiation position of the specimen 1 by a nozzle 48, to form a thin coat and remove the specimen surface. This can easily set a working position without damaging the specimen.
申请公布号 JPH09185950(A) 申请公布日期 1997.07.15
申请号 JP19960292023 申请日期 1996.11.01
申请人 SEIKO INSTR INC 发明人 KODAMA TOSHIO
分类号 H01J37/30;H01J37/20;H01L21/203;H01L21/302;H01L21/3065;(IPC1-7):H01J37/30;H01L21/306 主分类号 H01J37/30
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