发明名称 ELECTRON BEAM INSPECTION EQUIPMENT
摘要 <p>PROBLEM TO BE SOLVED: To inspect the size of a defect of an insulating film and the number thereof by a method wherein electron beams equivalently transmissive and not transmissive through the insulating film are cast, and secondary electrons are detected and subjected to comparison with the shape of a pattern. SOLUTION: When electron beams decelerated to a necessary speed are cast on a sample 32 by a power source 26, secondary electrons are generated. Part or most of the secondary electrons which pass through an auxiliary electrode 9 are caught by a secondary electron detector 22 and a detected current is amplified by an amplifier 28 and inputted to a display unit 29. Besides, a deflection signal generated by an oscillator 24, which is amplified by a power source 23 and given to a deflection coil for scanning the electron beams, is also given synchronously to the display unit 29 are information signals corresponding to a defect of an insulating film are displayed in the display unit 29 as a two-dimensional luminance modulation display, a linear display or the like. As to various samples having insulating films, accordingly, the size of the defect of the insulating film, the number thereof, etc., which can not been inspected usually can be detected.</p>
申请公布号 JPH09186211(A) 申请公布日期 1997.07.15
申请号 JP19970008015 申请日期 1997.01.20
申请人 HITACHI LTD 发明人 HOSOKI SHIGEYUKI;ICHIHASHI MIKIO;WADA YASUO;MUNAKATA TADASUKE;HONDA YUKIO
分类号 G01N23/225;H01J37/22;H01L21/66;(IPC1-7):H01L21/66 主分类号 G01N23/225
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