| 摘要 |
PROBLEM TO BE SOLVED: To form a photocured pattern efficiently at high sensitivity in a short exposure time and with less exposure by incorporating a specified polymer and a water-soluble polymer having 1,2-glycol bonds on the straight chain. SOLUTION: The water-soluble photosensitive resin composition comprises the water-soluble polymer having the 1,2-glycol bonds in the straight chain and the photosensitive polymer having structural units each represented by formulae I and II in which R is an H atom or a methyl group; and X is an Na or k atom or an ammonium group. The above composition may properly contain, in addition to these essential components, various kinds of compatible additives, such as colorants, plasticizers, surfactants, and coupling agents for enhancing adhesion with a substrate. |
