| 摘要 |
<p>PROBLEM TO BE SOLVED: To improve cleaning performance with a small cleaning space and smaller consumption of washing solution, by joining a chemical cleaning module, a pure water cleaning module, and a dry and cleaning module, and injecting each cleaning solution in a container according to each module while the container is carried continuously through these modules. SOLUTION: A wafer cleaning container 1 has an opening 3 on the upper face as an inlet/outlet for a wafer 2, a plurality of grooves 5 on the inside of a side wall 6 for storing and taking out the wafer 2 and an injection opening 7 for a cleaning solution. Then, the container 1 is carried continuously from a chemical cleaning module 13a, through a pure water cleaning module 13b to a dry and cleaning module 13c. In each module, the chemical solution or pure water spouted from a feeding opening 19 through a nozzle 16 is injected to the container 1 to clean the wafer 2 with the chemical solution or the pure water. After that the wafer 2 is dried in the dry and cleaning module 13c.</p> |
