Radiation-sensitive resist composition comprising a diazoketone

摘要

PCT No. PCT/DE94/00740 Sec. 371 Date Jan. 5, 1996 Sec. 102(e) Date Jan. 5, 1996 PCT Filed Jun. 28, 1994 PCT Pub. No. WO95/02851 PCT Pub. Date Jan. 26, 1995A radiation-sensitive resist composition for manufacturing highly resolved relief structures is characterized by the following components: a film-forming base polymer; a radiation-active component that releases an acid when irradiated; a radiation-sensitive ester-former; and a solvent.