发明名称 RESIN BLACK MATRIX AND PASTE FOR RESIN BLACK MATRIX
摘要 <p>PROBLEM TO BE SOLVED: To obtain a resin black matrix which has high light shieldability and excellent surface flatness and is improved in adhesion property to substrate by incorporating a siloxane bond into the main chain of the polyimide of the resin black matrix formed by dispersing a light shielding agent into the polyimide. SOLUTION: A siloxane bond is incorporated into the main chain of the polyimide of the resin black matrix formed by dispersing a light shielding agent into the polyimide. The paste for the resin black matrix is a paste for resin black matrix contg. polyamic acid, solvent and light shielding agent. The polyamic acid contains the siloxane bond in the main chain. The polyimide obtd. by heating the polyamic acid obtd. by bringing diamine and detracarboxylic dianhydride into reaction or by imidization with a suitable catalyst has the structural unit expressed by the formula. In the formula, R<1> denotes 1 to 22C bivalent org. group, R<2> denotes 2 to 22C quadrivalent org. group.</p>
申请公布号 JPH09184912(A) 申请公布日期 1997.07.15
申请号 JP19950344202 申请日期 1995.12.28
申请人 TORAY IND INC 发明人 YOSHIOKA MASAHIRO;KUBOTA YASUO;NOMURA HIDESHI;GOTO TETSUYA
分类号 G02B5/20;C08G73/10;C08K3/04;C08L79/08;(IPC1-7):G02B5/20 主分类号 G02B5/20
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