发明名称 OBSERVING METHOD OF SECTION OF INTEGRATED CIRCUIT
摘要 PROBLEM TO BE SOLVED: To prevent an effect of an indented part of a surface from appearing in a section as a longitudinal stripe and thereby to enable attainment of an exact section, by tilting a sample at the time of processing the section at an arbitrary position of the sample and by forming the section in the direction vertical to a plane containing the axis of the tilt. SOLUTION: The position of contact of a sample LSI 1 to be observed is determined on the basis of a scanning ion microscope image and then a region 3 containing the contact is filmed by, an FIBCVD method. After filming, a sample stage is rotated so that the direction on the surface of the sample of a part of which the section is to be formed be at an angle of 90 deg. to the axis of the tilt, and then a square-shape hole is made 4 by an etching function, with the position 2 of the section to be observed made one side, by tilting the sample stage at an appropriate angle. Since FIB is cast obliquely on the sample 1 at the time of this processing of the section, a longitudinal stripe of the plane of the section due to steep indentation of the surface does not appear, and even when the effect thereof is produced, it is so small that only a few slant stripes are left, and thus an exact shape of the section is obtained.
申请公布号 JPH09186210(A) 申请公布日期 1997.07.15
申请号 JP19960315222 申请日期 1996.11.26
申请人 SEIKO INSTR INC 发明人 IZAI HIROYASU;MINAFUJI TAKASHI
分类号 H01L21/66;H01J37/252;H01J37/31;H01L21/302;H01L21/3065 主分类号 H01L21/66
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