发明名称 |
Novolak resin blends for photoresist applications |
摘要 |
The present invention relates to a water insoluble, aqueous alkali soluble novolak resin blend, wherein the resin blend comprises two novolaks having dissimilar relative molecular weights and similar dissolution rates, a process for producing such a resin blend, a photoresist containing such a resin blend and a method for producing a semi-conductor device utilizing such a photoresist.
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申请公布号 |
US5646218(A) |
申请公布日期 |
1997.07.08 |
申请号 |
US19960692306 |
申请日期 |
1996.08.05 |
申请人 |
HOECHST-CELANESE CORP. |
发明人 |
LYNCH, THOMAS J.;SOBODACHA, CHESTER J.;DURHAM, DANA L. |
分类号 |
C08G8/08;C08L61/04;C08L61/06;G03F7/023;(IPC1-7):C08F283/00;C08G8/28;C08L61/00 |
主分类号 |
C08G8/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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