| 摘要 |
PROBLEM TO BE SOLVED: To feed a granular target material without breaking the vacuum in a film forming chamber and to prevent the change of the film forming rate caused by the reduction of the target material. SOLUTION: The inside of a chamber is provided with a vibration feeding member 3 housing a granular sputtering target material and movable to a target 1. By vibrating the granular material housed in the vibration feeding member 3, the target material reduced by sputtering operation by each time is fed to the target 1 from a nozzle 5 provided on the vibration feeding member 3. |
