发明名称 |
Dual cylindrical target magnetron with multiple anodes |
摘要 |
Two adjacent rotating cylindrical targets are used in a specific form of a vacuum sputtering system to deposit a film of material onto a substrate. Elongated anodes are provided on opposite sides and in between the targets in a manner to make more uniform the rate of deposition across the substrate.
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申请公布号 |
US5645699(A) |
申请公布日期 |
1997.07.08 |
申请号 |
US19960667773 |
申请日期 |
1996.06.21 |
申请人 |
THE BOC GROUP, INC. |
发明人 |
SIECK, PETER A. |
分类号 |
C23C14/34;C23C14/35;C23C14/56;H01J37/34;(IPC1-7):C23C14/35 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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