发明名称 LOW VOLTAGE ELECTROSTATIC CLAMP FOR SUBSTRATES SUCH AS DIELECTRIC SUBSTRATES
摘要 <p>An electrostatic clamp (10) for dielectric substrates (12) is operated with a low voltage electric source by reducing the width of electrode lines (14) to less than 100 νm and by reducing the spacing between adjacent electrode lines to less than 100 νm. The electrostatic clamp (10) includes an array of electrodes (14) such as aluminum formed on a base of insulating material (12) such as glass and covered by an insulating layer (24) such as nitride which covers and protects the electrodes. Electrical contacts (16, 18) apply voltages of opposite polarities to alternating electrode lines (14) to create a non-uniform electric field which causes a dielectric substrate (22) to be pulled toward the region of highest electric field. The reduced width electrode lines and spacings are created by the use of micro-lithographic techniques including thin film deposition and etching for formation of the electrode and the coating layers.</p>
申请公布号 WO1997023945(A1) 申请公布日期 1997.07.03
申请号 US1996020883 申请日期 1996.12.20
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