发明名称 Photosensitive polyimidosiloxanes and compositions and insulating films made thereof
摘要 A photosensitive polyimidosiloxane obtained by polymerization and chemical imidation of an aromatic tetracarboxylic dianhydride having two benzene rings bonded either directly or via CO or O, and an aromatic diamine with a photosensitive group and a diamine which includes diaminopolysiloxane. It may be used to form films with large thicknesses and excellent photocuring properties and solubility in organic solvents, while high-temperature heat treatment thereof is unnecessary and the electrical and mechanical characteristics of its cured films are satisfactory.
申请公布号 EP0755962(A3) 申请公布日期 1997.07.02
申请号 EP19960111577 申请日期 1996.07.18
申请人 UBE INDUSTRIES, LTD. 发明人 ISHIKAWA, SEIJI;YASUNO, HIROSHI;SAKURAI, HIROYUKI
分类号 C08G73/10;C08G77/455;C08L79/08;C09D183/10;G03F7/038;G03F7/075;H01B3/30 主分类号 C08G73/10
代理机构 代理人
主权项
地址