发明名称 |
Photosensitive polyimidosiloxanes and compositions and insulating films made thereof |
摘要 |
A photosensitive polyimidosiloxane obtained by polymerization and chemical imidation of an aromatic tetracarboxylic dianhydride having two benzene rings bonded either directly or via CO or O, and an aromatic diamine with a photosensitive group and a diamine which includes diaminopolysiloxane. It may be used to form films with large thicknesses and excellent photocuring properties and solubility in organic solvents, while high-temperature heat treatment thereof is unnecessary and the electrical and mechanical characteristics of its cured films are satisfactory. |
申请公布号 |
EP0755962(A3) |
申请公布日期 |
1997.07.02 |
申请号 |
EP19960111577 |
申请日期 |
1996.07.18 |
申请人 |
UBE INDUSTRIES, LTD. |
发明人 |
ISHIKAWA, SEIJI;YASUNO, HIROSHI;SAKURAI, HIROYUKI |
分类号 |
C08G73/10;C08G77/455;C08L79/08;C09D183/10;G03F7/038;G03F7/075;H01B3/30 |
主分类号 |
C08G73/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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