发明名称 Method for manufacturing a flat-panel display
摘要 A liquid crystal display having a gate insulating film of whose dielectric constant is a high and exhibits excellent leakage characteristics, includes a plurality of gate wirings formed on the transparent substrate, a plurality of signal lines arrayed to intersect the plurality of gate wirings, a plurality of switching devices located at the point of intersection between the respective gate wirings and signal lines. The switching device comprises a gate electrode constituted by aluminum or an aluminum alloy and a gate insulating film inserted between the channels of switching devices and the gate electrode. The gate insulating film has a first anodic oxide film constituted by aluminum or an aluminum alloy and a second anodic oxide film constituted by tantalum or a tantalum alloy. In the manufacturing method thereof, metals, aluminum or tantalum, are simultaneously anodically oxidized so as to suppress a hillock. An insulating layer having a high dielectric constant can be easily obtained while a leakage current characteristic is strengthened and its breakdown voltage is improved. A glass substrate can be protected since second and third anodic oxide films (Ta2O5) are formed on the entire surface of the substrate.
申请公布号 US5643817(A) 申请公布日期 1997.07.01
申请号 US19940241856 申请日期 1994.05.12
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, KYUNG-SEOB;KIM, CHI-WOO;KWEON, YOUNG-CHAN;CHANG, WON-KIE
分类号 G02F1/136;G02F1/1333;G02F1/1368;H01L21/316;H01L21/336;H01L21/77;H01L21/822;H01L21/84;H01L27/04;H01L29/78;H01L29/786;(IPC1-7):H01L21/786 主分类号 G02F1/136
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