发明名称 Semiconductor device having a p-type ohmic electrode structure
摘要 A p-type ohmic metal electrode for use with a group II-VI semiconductor device. The p-type ohmic metal electrode is made of a group II-IV p-type semiconductor layer having a group II element other than zinc dispersed in that layer disposed on the group II-IV semiconductor device, and a metal electrode layer disposed on the group II-IV semiconductor layer including the group II element other than zinc. Also disclosed is a group II-IV semiconductor device including a p-type group II-IV semiconductor containing zinc and selenium and the above ohmic metal electrode disposed on the group II-IV semiconductor device. Additionally, a group II-IV semiconductor device including a p-type group II-IV semiconductor containing zinc and selenium, a layer of a group II element other than zinc disposed on the group II-IV semiconductor device, and a metal electrode layer disposed on the layer of the group II element other than zinc is disclosed.
申请公布号 US5644165(A) 申请公布日期 1997.07.01
申请号 US19960606867 申请日期 1996.02.27
申请人 MITSUBISHI KASEI CORPORATION 发明人 GOTO, HIDEKI
分类号 H01L21/441;H01L33/28;H01L33/30;H01L33/40;H01S5/00;(IPC1-7):H01L31/032;H01L29/22;H01L23/48;H01L23/52 主分类号 H01L21/441
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