Plasma processing systems

摘要

A coil shield assembly (48) for an RF field coil (34) in a plasma processing system includes a first shield (50) positioned inside the coil. The first shield has a central opening substantially surrounding a central space of a processing chamber in which the plasma is maintained. At least one slot (52) is formed in the first shield and extends therethrough. A barrier (54) is positioned between the first shield and the coil and spaced apart from the first shield near the at least one slot. The slot permits an RF signal from the coil to couple with the plasma, and the first shield and the barrier are structured and arranged to prevent plasma ions or sputtered material from bombarding the coil by a direct path from the central space and through the at least one slot.