| 摘要 |
PROBLEM TO BE SOLVED: To ensure superior sensitivity, resolution, heat resistance, developability and patterning form as well as superior focus latitude especially in a fine pattern of 0.3-0.4μm order by incorporating a radiation sensitive compd. and an alkali-soluble resin obtd. by condensing specified phenol with a polyphenolic compd. and aldehyde. SOLUTION: This resin compsn. contains a radiation sensitive compd. and an alkali-soluble resin obtd. by condensing phenol represented by formula I with a polyphenolic compd. represented by formula II and/or a polyphenolic compd. represented by formula III and aldehyde. In the formulae, each of R1 -R3 is H, 1-4C alkyl or alkoxy group, (k) is 1 or 2 and each of R4 -R22 is H, OH, methylol, 1-4C alkyl or alkoxy group. |
