| 摘要 |
A method for manufacturing a semiconductor device uses a stepper of a low resolution, uses the first and second light-exposure masks, performs a double light-exposure to make a proper energy light be partially overlapped, and easily forms a fine pattern below the stepper's resolution. The method includes the steps of: using a first light-exposure mask having a line/space pattern, and performing a primary light-exposure with an insufficient energy to pattern the photoresist liquid; performing a secondary overlay light-exposure with a sufficient energy to pattern the photoresist liquid on the primary light-exposure photoresist liquid, by using a second light-exposure mask having a line/space pattern; and forming a photoresist film pattern for a ling-space patterning by developing the photoresist liquid.
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