发明名称 |
PLASMA DEPOSITED FILM NETWORKS |
摘要 |
<p>A three-dimensional functional film network comprising a plurality of radio frequency discharge plasma film layers. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three-dimensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks significantly increases the surface functional density.</p> |
申请公布号 |
WO9722631(A1) |
申请公布日期 |
1997.06.26 |
申请号 |
WO1996US20267 |
申请日期 |
1996.12.18 |
申请人 |
TALISON RESEARCH |
发明人 |
KOLLURI, OMPRAKASH, S.;JOHANSON, ROBERT, G. |
分类号 |
H05H1/02;B05D1/36;B05D7/00;B05D7/24;C08F2/46;C08F2/48;C08F8/00;C08G83/00;C23C14/28;H05B6/00;H05B6/46;H05H1/24;(IPC1-7):C08F2/48;C23C14/30 |
主分类号 |
H05H1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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