发明名称 PLASMA DEPOSITED FILM NETWORKS
摘要 <p>A three-dimensional functional film network comprising a plurality of radio frequency discharge plasma film layers. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three-dimensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks significantly increases the surface functional density.</p>
申请公布号 WO9722631(A1) 申请公布日期 1997.06.26
申请号 WO1996US20267 申请日期 1996.12.18
申请人 TALISON RESEARCH 发明人 KOLLURI, OMPRAKASH, S.;JOHANSON, ROBERT, G.
分类号 H05H1/02;B05D1/36;B05D7/00;B05D7/24;C08F2/46;C08F2/48;C08F8/00;C08G83/00;C23C14/28;H05B6/00;H05B6/46;H05H1/24;(IPC1-7):C08F2/48;C23C14/30 主分类号 H05H1/02
代理机构 代理人
主权项
地址
您可能感兴趣的专利