发明名称 PLASMA DEPOSITED FILM NETWORKS
摘要 <p>A three-dimensional functional film network comprising a plurality of radio frequency discharge plasma film layers. The plasma film layers include a first layer, comprising a plurality of a first functional group, and a second layer, comprising a plurality of a second functional group. The employment of three-dimensional film networks with desired functional groups located either on the periphery or both the periphery and interstitial spaces of the networks significantly increases the surface functional density.</p>
申请公布号 WO1997022631(A1) 申请公布日期 1997.06.26
申请号 US1996020267 申请日期 1996.12.18
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