发明名称 |
Temperature gradient sintering furnace |
摘要 |
Apparatus for sintering porous layers, deposited on a temperature-stable wafer, includes: (a) a closed housing (1), through which flushing gas is passed; (b) a temperature resistant base (2) provided, on its top face, with flat depressions (4) for holding wafers; and (c) resistance heating elements (3) located in the base (2). Preferably, the base (2) consists of corundum.
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申请公布号 |
DE19547601(A1) |
申请公布日期 |
1997.06.26 |
申请号 |
DE19951047601 |
申请日期 |
1995.12.20 |
申请人 |
ALCATEL SEL AG, 70435 STUTTGART, DE |
发明人 |
WEBER, DIETER, DR.RER.NAT., 70806 KORNWESTHEIM, DE |
分类号 |
F27B21/00;F27D5/00;(IPC1-7):H01L21/324;F27B5/00 |
主分类号 |
F27B21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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