发明名称 Temperature gradient sintering furnace
摘要 Apparatus for sintering porous layers, deposited on a temperature-stable wafer, includes: (a) a closed housing (1), through which flushing gas is passed; (b) a temperature resistant base (2) provided, on its top face, with flat depressions (4) for holding wafers; and (c) resistance heating elements (3) located in the base (2). Preferably, the base (2) consists of corundum.
申请公布号 DE19547601(A1) 申请公布日期 1997.06.26
申请号 DE19951047601 申请日期 1995.12.20
申请人 ALCATEL SEL AG, 70435 STUTTGART, DE 发明人 WEBER, DIETER, DR.RER.NAT., 70806 KORNWESTHEIM, DE
分类号 F27B21/00;F27D5/00;(IPC1-7):H01L21/324;F27B5/00 主分类号 F27B21/00
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