发明名称 PRODUCTION OF MULTILAYER WIRINGS
摘要 PURPOSE:To reduce the wire width of a top wiring layer and increase the scale of integration by using a thin conductive film not eroded by an etching solution as an underlayer film at the time of photoetching for patteming of the top wiring layer.
申请公布号 JPS52149990(A) 申请公布日期 1977.12.13
申请号 JP19760066556 申请日期 1976.06.09
申请人 发明人
分类号 H05K3/46;H01L21/768;H01L23/522;H05K3/00 主分类号 H05K3/46
代理机构 代理人
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