| 摘要 |
PROBLEM TO BE SOLVED: To obtain a compsn. for forming an antireflection film to be intervened between the antireflection film and photoresist film laminated and formed on a substrate by consisting this compsn. of an aq. medium and the polyvinyl alcohol (PVA) dissolved therein. SOLUTION: This compsn. is an intermediate film compsn. for forming an intermediate film to be intervened between the antireflection film and the photoresist film laminated and formed on the substrate and the photoresist film. Namely, the intermediate film is formed by applying the intermediate compsn. consisting of the aq. medium and the PVA dissolved therein on the antireflection film formed on the substrate. Further, a photoresist compsn. is applied thereon to form the photoresist film, by which the influence of light interference in photolithography is eliminated without requiring any laborious etching operations at all. This intermediate film compsn. is hardly mixable with org. solvents and does not give rise to mixing even if the antireflection compsn. applied on the lower layer by using the org. solvent exists on this layer. |
