| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a positive photoresist compsn. having excellent properties such as resolution, resistance against a delay effect and profile and having small dependence on post-exposure baking(PEB) and excellent sensitivity, film remaining rate and coating property. SOLUTION: A polyvinyl phenol resin in which phenol hydroxyl groups are partly protected is used as an alkali-soluble resin of this positive photoresist compsn. A sulfonate of an N-hydroxyimide compd. is used as an acid producing agent. Moreover, an amine compd. and an electron-donating material having <=1.7eV oxidation-reduction potential are compounded into the compsn. The obtd. compsn. has excellent resist properties such as resolution and profile and is hardly influenced by the period from exposure to PEB.</p> |
