| 摘要 |
PROBLEM TO BE SOLVED: To obtain a photosensitive compsn. excellent in transmittance to light of short wavelength such as ArF excimer laser light and capable of forming a resist pattern having satisfactory resolution with high sensitivty by incorporating a compd. having an acid-decomposable group or an acid- crosslinkable group and a specified compd. SOLUTION: This photosensitive compsn. for forming a pattern by exposure with ArF or F2 excimer laser light contains a compd. having an acid- decomposable group or an acid-crosslinkable group and a compd. represented by the formula, wherein each of Ar<1> and Ar<2> is an arom. ring or a condensed arom. ring, each of R<1> and R<2> is halogen or a monovalent org. group, X is CF3 SO3 , SbF6 , AsF6 , etc., Z is Cl, Br, I, S-R (R is 1-10C alkyl or perfluoroalkyl), etc., and each of (m) and (n) is 0 or a positive integer. |
