发明名称 METHOD AND EQUIPMENT FOR CLEANING FRINGE PART OF SUBSTRATE
摘要 PROBLEM TO BE SOLVED: To remove coated liquid at a constant width along the fringe part a substrate. SOLUTION: A gate type supporting frame 20 provided while straddling the carrying path on the upstream side of a suction rotary unit and sensors 21a, 21b, 21c for detecting the contact with a substrate W passing below are fixed to the supporting frame 20. When a substrate W is carried to a cleaning station 3 by means of a carrying jig 4, the sensors 21a, 21b, 21c detect at least three point on the outer circumference of disc like substrate. Center of a circumcircle passing through three detected points is then determined and recognized as the center of disc like substrate W. Subsequently, the suction rotary unit is shifted to a position where the center of disc like substrate W is aligned with the center of a chuck 13 in the suction rotary unit and stands by thereat. The substrate W is delivered onto the chuck 13 from a carrier 4 at that position and then the suction rotary unit is shifted to a predetermined position where coated liquid is removed at a constant width from the fringe of substrate W by means of a fringe cleaner 16.
申请公布号 JPH09167750(A) 申请公布日期 1997.06.24
申请号 JP19950325576 申请日期 1995.12.14
申请人 TOKYO OHKA KOGYO CO LTD 发明人 OKANO SUSUMU;UEDA YASUJI;MIYAMOTO HIDENORI;SHIMAI FUTOSHI
分类号 G03F7/16;B08B3/02;G03F7/20;G03F7/26;H01L21/027;H01L21/304;H01L21/677;H01L21/68;(IPC1-7):H01L21/304 主分类号 G03F7/16
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